FORMATION CONSTANTS OF ION PAIR-LIGAND COMPLEXES. APPLICATION OF CROWN ETHER NETWORK POLYMERSSINTA R; SMID J.1981; J. AM. CHEM. SOC.; ISSN 0002-7863; USA; DA. 1981; VOL. 103; NO 23; PP. 6962-6963; BIBL. 10 REF.Article

COMPLEXES OF POLYACIDS WITH POLY(VINYLBENZOCROWN ETHER)S AND POLYVINYLBENZOGLYMES IN WATERJAYCOX GD; SINTA R; SMID J et al.1982; J. POLYM. SCI., POLYM. CHEM. ED.; ISSN 0360-6376; USA; DA. 1982; VOL. 20; NO 6; PP. 1629-1638; BIBL. 25 REF.Article

FORMATION CONSTANTS OF COMPLEXES BETWEEN CROWN ETHERS AND ALKALI PICRATES IN APOLAR SOLVENTS. APPLICATION OF CROWN ETHER NETWORK POLYMERSSINTA R; ROSE PS; SMID J et al.1983; JOURNAL OF THE AMERICAN CHEMICAL SOCIETY; ISSN 0002-7863; USA; DA. 1983; VOL. 105; NO 13; PP. 4337-4343; BIBL. DISSEM.Article

CATALYTIC PROPERTIES OF POLYMERS CONTAINING CROWN ETHERSSMID J; KIMURA K; SHIRAI M et al.1981; POLYM. PREPR., AM. CHEM. SOC., DIV. POLYM. CHEM.; ISSN 0032-3934; USA; DA. 1981; VOL. 22; NO 1; PP. 163; BIBL. 2 REF.Conference Paper

FLC mixtures with broad temperature rangesADAMS, T. G; SINTA, R.Molecular crystals and liquid crystals (1969). 1989, Vol 177, pp 145-153, issn 0026-8941Article

Ion-binding properties of network polymers with pendant crown ether ligandsSMID, J; SINTA, R.Polymer science and technology (New York, N.Y.). 1984, Vol 24, pp 329-343, issn 0093-6286Article

Novel thermotropic polyesteramidesSINTA, R; GAUDIANA, R. A; ROGERS, H. G et al.Journal of macromolecular science. Chemistry. 1989, Vol 26, Num 5, pp 773-785, issn 0022-233XArticle

Ion binding properties of crown ether containing network polymersSINTA, R; LAMB, B; SMID, J et al.Macromolecules. 1983, Vol 16, Num 8, pp 1382-1389, issn 0024-9297Article

Chain amplified photoacid generation from vicinal dibromides. A general strategy for the efficient generation of hydrogen bromide across the ultraviolet and visible spectrumSCAIANO, J. C; BARRA, M; SINTA, R et al.Chemistry of materials. 1996, Vol 8, Num 1, pp 161-166, issn 0897-4756Article

Infrared spectral study of noncrystalline rodlike polymersGAUDIANA, R. A; SINTA, R. F.Journal of polymer science. Part A. Polymer chemistry. 1991, Vol 29, Num 1, pp 45-53, issn 0887-624X, 9 p.Article

Aromatic monoazines as fluorescent sensors for photoacid generation in thin polymer filmsPOHLERS, G; VIRDEE, S; SCAIANO, J. C et al.Chemistry of materials. 1996, Vol 8, Num 11, pp 2654-2658, issn 0897-4756Article

Photoreaction of vicinal dibromides with alcohols : chain-amplified generation of hydrogen bromideSCAIANO, J. C; BARRA, M; KRZYWINSKI, M et al.Chemistry of materials. 1995, Vol 7, Num 5, pp 936-940, issn 0897-4756Article

Amorphous rigid-rod polymersGAUDIANA, R. A; MINNS, R. A; SINTA, R et al.Progress in polymer science. 1989, Vol 14, Num 1, pp 47-89, issn 0079-6700Article

Photochemical studies of atomic species (F, Br, O) in solutionSCAIANO, J. C; BUCHER, G; BARRA, M et al.Journal of photochemistry and photobiology. A, Chemistry. 1996, Vol 102, Num 1, pp 7-11, issn 1010-6030Conference Paper

Flash photolysis study of melamine cross-linking agents : dual role a cross-linker and photosensitizerBARRA, M; SCAIANO, J. C; CALABRESE, G. C et al.Chemistry of materials. 1994, Vol 6, Num 6, pp 724-726, issn 0897-4756Article

Soluble, amorphous, para-linked aromatic polyestersSINTA, R; MINNS, R. A; GAUDIANA, R. A et al.Journal of polymer science. Polymer letters edition. 1987, Vol 25, Num 1, pp 11-17, issn 0360-6384Article

Model studies on the photochemistry of phenolic sulfonate photoacid generatorsANDRAOS, J; BARCLAY, G. G; MEDEIROS, D. R et al.Chemistry of materials. 1998, Vol 10, Num 6, pp 1694-1699, issn 0897-4756Article

Development of DUV resist formulations with excellent performance on metal substratesXAJARATNAM, M; CAMERON, J; GEORGER, J et al.SPIE proceedings series. 1998, pp 692-705, isbn 0-8194-2778-0, 2VolConference Paper

Living free-radical polymerizations in the absence of initiators : Controlled autopolymerizationDEVONPORT, W; MICHALAK, L; MALMSTRÖM, E et al.Macromolecules. 1997, Vol 30, Num 7, pp 1929-1934, issn 0024-9297Article

Deconstructing the resist to probe innate material roughnessFEDYNYSHYN, T. H; SINTA, R. F; ASTOLFI, D. K et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 615315.1-615315.11Conference Paper

Photochemistry of phenothiazine sensitizers in poly(methyl methacrylate) filmsBARRA, M; REDMOND, R. W; ALLEN, M. T et al.Macromolecules. 1991, Vol 24, Num 17, pp 4972-4977, issn 0024-9297Article

Molecular factors affecting solubility in rigid-rod polyamidesGAUDIANA, R. A; MINNS, R. A; ROGERS, H. G et al.Journal of polymer science. Part A. Polymer chemistry. 1987, Vol 25, Num 5, pp 1249-1271, issn 0887-624XArticle

Lithographic and chemical contrast of single component top surface imaging (TSI) resistsBOHLAND, J. F; CHAMBERS, J; DAS, S et al.SPIE proceedings series. 1998, pp 1009-1016, isbn 0-8194-2778-0, 2VolConference Paper

Photoacid generation in chemically amplified resists : Elucidation of structural effects of photoacid generators using new acid sensitive dyes for monitoring acid generationCAMERON, J. F; MORI, J. M; ZYDOWSKY, T. M et al.SPIE proceedings series. 1998, pp 680-691, isbn 0-8194-2778-0, 2VolConference Paper

New ESCAP-type resist with enhanced etch resistance and its application to future DRAM and logic devicesCONLEY, W; BRUNSVOLD, B; MULLER, P et al.SPIE proceedings series. 1997, pp 282-299, isbn 0-8194-2463-3Conference Paper